ICTM Collaborative R&D 2020

Can OPC UA be utilized for process parameter monitoring during additive manufacturing via LMD?

Challenge and Motivation

• OPC UA standard machine interface can be applied for parameter and condition monitoring in macnufacturing processes. 
• For LMD based AM processes the potential of monitoring machine parameters is unknown.
• The monitoring data based correlation between process parameters, melt pool characteristics and welding results is not elaborated yet.
  

Objective

• Assessment of performance and suitability of OPC UA for process parameter monitoring in AM.
• Mathermatical evaluation of the relevance of monitored LMD process parameters.