ICTM Collaborative R&D 2020

Evaluation of OPC UA Machine Interface for Parameter Monitoring during AM#

Can OPC UA be utilized for process parameter monitoring during additive manufacturing via LMD?

 

Challenge and Motivation

  • OPC UA standard machine interface can be applied for parameter and condition monitoring in macnufacturing processes. 
  • For LMD based AM processes the potential of monitoring machine parameters is unknown.
  • The monitoring data based correlation between process parameters, melt pool characteristics and welding results is not elaborated yet.

Objective

  • Assessment of performance and suitability of OPC UA for process parameter monitoring in AM.
  • Mathermatical evaluation of the relevance of monitored LMD process parameters.